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Shenyang Kejing Automation Equipment Co., Ltd
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Shenyang Kejing Automation Equipment Co., Ltd

  • E-mail

    kejing@sykejing.com

  • Phone

    18624331856,18624331865,18624331992,18624331806,18

  • Address

    No. 26-2-7 Xuefeng Road, Hunnan New District, Shenyang, Precision Instrument Industrial Park

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ME-L fully automatic high-precision Mueller matrix ellipsometer

NegotiableUpdate on 02/18
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Overview

ME-L is a research grade fully automatic high-precision Mueller matrix ellipsometer, which embodies the research team's years of investment in ellipsometry technology. It adopts cutting-edge innovative technologies in the industry, including achromatic compensator, dual rotation compensator synchronous control, Mueller matrix data analysis, etc. Can be applied to research on semiconductor thin film structures, semiconductor periodic nanostructures, new materials, new physical phenomena, flat panel displays, photovoltaic solar energy, functional coatings, biological and chemical engineering, block material analysis, as well as various isotropic/anisotropic thin film material film thicknesses, optical nano grating constants, and one-dimensional/two-dimensional nano grating material structures

Product Details

Product Model

ME-L fully automatic high-precision Mueller matrix ellipsometer

Main Features

1. Using a composite light source of deuterium lamp and halogen lamp, the spectrum covers the ultraviolet to near-infrared range (193-2500nm)

2. It can achieve Mueller matrix data processing, with a larger amount of measurement information, faster measurement speed, and more accurate data

3. Based on a dual rotation compensator configuration, all 16 elements of the Mueller matrix can be measured in one go, providing richer and more comprehensive measurement information compared to traditional spectroscopic ellipsometers

4. Ensure the provision of high-quality and stable spectra across a wide spectral range

5. Hundreds of material databases and multiple algorithm model libraries cover the vast majority of optoelectronic materials currently available

6. Integrate the analysis of nano gratings to simultaneously measure and analyze geometric morphology information such as nanostructure period, line width, line height, sidewall angle, roughness, etc

Technical Specifications

1. Application: Research level/Enterprise level

2. Basic functions: Psi/Delta, R/T, Mueller matrix and other spectra

3. Spectral analysis: 380-1000nm (supports extension to 210-1650nm)

4. Single measurement time: 1-8s

5. Repeatability measurement accuracy: 0.005nm

6. Accuracy (direct measurement of air)

Elliptical polarization parameter: ψ=45 ± 0.05 ° △=0 ± 0.1 °

Mueller matrix: diagonal element m=1 ± 0.005; Non diagonal element m=0 ± 0.005

7. Spot size: large spot 2-3mm; small spot 200 μ m

Optional configuration

Band selection

V:380-1000nm

UV:245-1000nm

XN:210-1650nm

DN+:193-2500nm

Angle selection

Automatic: 45-90 °

Manual: 55-75 ° (5 ° step), 90 °

Fixed: 65 °

Other options

Mapping selection: 100 × 100mm (for reference, customized as needed)

Temperature control table: Room temperature up to 600C (for reference, customized as needed)

Optional accessories

1

Temperature control table

2

Mapping extension module

3

vacuum pump

4

Transmission adsorption component