Hitachi Scanning Electron Microscope SU1510

NegotiableUpdate on 03/18

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Overview

The Hitachi scanning electron microscope SU1510 adopts a sophisticated design, reducing its volume by 20% compared to similar devices with the same resolution and configuration, saving space. It is equipped with secondary electron and backscatter detectors as standard, making it easy to observe morphology and contrast at the same time. It features the four bias voltage, four aperture stop, high-resolution backscatter, and long liner design commonly found in Hitachi tungsten filament electron microscopes.

Product Details

Hitachi Scanning Electron Microscope SU1510

Product Introduction

Adopting exquisite design, the volume is reduced by 20% compared to similar devices with the same resolution and configuration, saving space. It is equipped with secondary electron and backscatter detectors as standard, making it easy to observe morphology and contrast at the same time. It has the four bias voltage, four aperture stop, high-resolution backscatter, and long liner design commonly found in Hitachi tungsten filament electron microscopes.

The host has a width of only 55cm, a compact size, and a high-performance variable pressure scanning electron microscope with a resolution of 3.0nm.

The main features of Hitachi scanning electron microscope SU1510 are:

1. The instrument body has been reduced by 20% compared to the past, allowing for more freedom in choosing the installation site.

2. Equipped with low vacuum function as standard, it can observe non-conductive materials without spraying. High and low vacuum conversion can be completed with just one click.

3. The sample stage can load samples with the largest diameter of 153mm and a height of 60mm (WD=15mm), and perform EDX analysis.

4. Powerful mouse control function, capable of performing all operations of the electron microscope.

5. Molecular pump vacuum system, clean and pollution-free.

Technical parameters:

Secondary electronic resolution	3.0nm (high vacuum, 30kV)
Backscattered electron resolution	4.0nm (low vacuum: 60Pa, 30kV)
magnification	5~300000 times
accelerating voltage	0.3~30 kV
sample stage	X 0~80mm Y 0~40mm Z 5~50mm T -20~80mm R 360°
Sample platform control	Manual (optional: 2-axis motor)
Zui Large Load Sample Size	Diameter: 153mm
Zui Grand View Scope	Diameter: 126mm (XYR combined)
Zui Large Sample Height	60mm (WD=15mm)
Low vacuum range	6-270Pa (set from menu)
filament	Centered cartridge filament
objective aperture	4-hole variable aperture
Gun bias voltage	Fixed proportional bias, manual bias, automatic 4-bias
detector	Secondary electron detector, high sensitivity semiconductor backscattered electron detector
EDX analysis location	WD=15mm,TOA=35°
vacuum system	1 molecular pump, 1 mechanical pump
safety measures	Power outage, leakage, automatic protection

Application fields:

semiconductor

biology

polymer