Electron beam evaporation coating system

Electron beam evaporation coating system
（E-Beam Evaporator System）
Instrument Introduction:
A professional manufacturer in the United States with over 20 years of rich experience in electron beam evaporation equipment, magnetron sputtering equipment, thermal evaporation equipment, and more. There are the following functional modes:
electron beam evaporation， Electron beam evaporation;
resistive evaporation， Thermal resistance evaporation;
ion beam assisted deposition (IBAD)， Ion beam assisted evaporation coating;
effusion cell， Source of diarrhea.


Technical Specifications:
Vacuum Chamber: 304 stainless steel cylindrical chamber with standard diameters of 18 inches and 24 inches - scaled to match the specific application;
Pumping: molecular pump or condenser pump;
Load Lock: Manual or automatic transfer, suitable for transferring small pieces of various shapes and sizes to 200mm large circular pieces, with high vacuum background transfer;
Process Control: PC/PLC automatic control interface, menu control, data acquisition, and remote control;
In Situ Monitoring&Control: QCM film thickness monitoring, optical film thickness monitoring;
RGA residual gas analysis;
Substrate Fixture: Single piece, multi piece, planetary substrate fixture;
Substrate Holders: can be heated, cooled, biased, and rotated;
Ion Source: Substrate pre cleaning, nano surface modification.

Deposition Techniques:
Magnetron Sputtering RF, DC, or Pulsed-DC， Capable of RF sputtering, DC sputtering, and pulsed DC sputtering;
Electron Beam Evaporation， Electron beam evaporation;
Thermal Evaporation， Thermal evaporation;
Organic Evaporation for OLED/ PLED and Organic Electronics， Organic evaporation (for OLED/PLED and organic electronics);
Glancing Angle Depostion (GLAD), Inclined angle sedimentation
Cathodic Arc Plasma Deposition, Cathodic plasma assisted deposition.