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Leica EM ACE200 Low Vacuum Coating Instrument

NegotiableUpdate on 01/13
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Overview
Leica EM ACE200 Low Vacuum Coating Instrument 2018/06/20 Leica EM ACE200 is a low vacuum coating instrument that can choose between ion sputtering for metal film coating or carbon wire evaporation for carbon film coating, or both. Can meet daily SEM needs, and can also be used for X-ray energy spectrum and spectral analysis, or TEM copper mesh carbon coating. Fully automatic computer control, automatically completes the entire process of vacuuming, coating, and venting, with one click operation. Adopting the currently popular touch screen control, it is simple and convenient. Features: • Optional ion sputtering mode, carbon wire evaporation carbon plating mode, or dual mode, optional glow discharge (for grid surface hydrophilicity) • Patent design pulse type carbon wire evaporation method, which can accurately control carbon film thickness • Optional quartz film thickness detector, which can accurately control coating thickness with an accuracy of 0.1nm • Fully automatic program control, automatically completes vacuum pumping, coating, gas release and other processes • Touch screen control, simple and convenient • Vacuum degree ≤ 7 × 10-3 mbar • Sputtering current: 0-150mA adjustable • Square sample chamber patent design, sample chamber size: 140mm (width) × 145mm (depth) × 150mm (height) • Working distance adjustment range: 30mm-100mm
Product Details

Leica EM ACE200 is a low vacuum coating instrument that can choose between ion sputtering for metal film coating or carbon wire evaporation for carbon film coating, or both. Can meet daily SEM needs, and can also be used for X-ray energy spectrum and spectral analysis, or TEM copper mesh carbon coating. Fully automatic computer control, automatically completes the entire process of vacuuming, coating, and venting, with one click operation. Adopting the currently popular touch screen control, it is simple and convenient.

characteristic

  Optional ion sputtering mode, carbon wire evaporation carbon plating mode, or dual-mode, optional glow discharge (for grid surface hydrophilicity)

  Patent design pulse type carbon filament evaporation method, which can accurately control the thickness of carbon film

  Optional quartz film thickness detector, precise control of coating thickness, accuracy up to 0.1nm

  Fully automatic program control, automatically completing processes such as vacuuming, coating, and venting

  Touch screen control, simple and convenient

  Vacuum degree ≤ 7 × 10-3 mbar

  Sputtering current: adjustable from 0-150mA

  Square sample chamber patented design, sample chamber size: 140mm (width) x 145mm (depth) x 150mm (height)

  Working distance adjustment range: 30mm-100mm