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E-mail
2875591053@qq.com
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Phone
13951612855
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Address
9th Floor, Building B1, Shouping Building, No. 2 Yongfeng Avenue, Qinhuai District, Nanjing City
Nanjing Kejie Analytical Instrument Co., Ltd
2875591053@qq.com
13951612855
9th Floor, Building B1, Shouping Building, No. 2 Yongfeng Avenue, Qinhuai District, Nanjing City
Nanjing Kejie NP2 Nitrogen Purifier
1name
NP2 nitrogen purifier
Nanjing Kejie NP2 Nitrogen Purifier
IIInstrument Introduction
The NP2 heated nitrogen purifier is a purifier product that can remove methane, while the non heated Metronics nitrogen purifier provides an economical option for allowing methane applications.
IIIApplication field
Domestic and imported models of gas chromatographs are used together.
4Performance Characteristics
1. Valco nitrogen purifier can purify active gas impurities below ppm level
1) The purity of the carrier gas is necessary in any extremely sensitive application, as impurities can limit the sensitivity of the detector and even damage the capillary column.
2. The purification substrate of the purifier is a non evaporative thermally stimulated active gas absorbing alloy. This stable alloy is loaded into a welded component and can be safely used in industrial applications with extremely simple preventive measures.
3. When the absorbent is heated, the oxide layer on the surface of the particles is eliminated, allowing N2 to diffuse into a large number of absorbent particles.
4. The design of the self-regulation function ensures that the purifier maintains the adsorbent raw material at the most suitable temperature, avoiding the possibility of overheating and loss of control during operation.
5. The microplate is designed to be installed in the upstream gas flow path of the gas chromatograph and connected to the injection port.
6. NPM can remove all pollutants generated by flow controllers, elastic sealing tubes, pressure regulators, and other uncleaned and leak proof system components.
5technical indicators
model |
NP2 |
Purified gas |
He, no, Ar, Kr, Xe, Rn, N2 |
The biggest work pressure |
1000psi |
Zui high working temperature |
400℃ |
Zui high flow velocity |
1L/min |
Can remove impurities |
Removable impurities: H2O, H2, O2, NO, NH3, CO, and CO2; |
Inlet impurity concentration: 10ppm level; | |
Export impurity concentration: below 10 ppb level; | |
Other removable impurities include CF4, CCl4, SiH4, and hydrocarbons. | |
Impurities not removed |
He, no, Ar, Kr, Xe, Rn, CH4, N2 |