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E-mail
2875591053@qq.com
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Phone
13951612855
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Address
9th Floor, Building B1, Shouping Building, No. 2 Yongfeng Avenue, Qinhuai District, Nanjing City
Nanjing Kejie Analytical Instrument Co., Ltd
2875591053@qq.com
13951612855
9th Floor, Building B1, Shouping Building, No. 2 Yongfeng Avenue, Qinhuai District, Nanjing City
Nanjing Kejie HP2 helium purifier
1name
HP2 helium purifier
Nanjing Kejie HP2 helium purifier
IIInstrument Introduction
In terms of removing nitrogen, the HP2 heated helium purifier is. In applications where nitrogen is allowed to exist, non heating Metronics helium purifiers provide an economical option.
IIIApplication field
Domestic and imported models of gas chromatographs.
4Performance Characteristics
1. The Valco helium purifier can purify helium or other inert gases, such as Ar, Ne, Kr, Xe, with impurities in active gases below ppm level
1) The purity of the carrier gas is necessary in any extremely sensitive application, as impurities can limit the sensitivity of the detector and even damage the capillary column.
2. The purification substrate of the purifier is a non evaporative thermally stimulated active gas absorbing alloy. This stable alloy is loaded into a welded component and can be safely used in industrial applications with extremely simple preventive measures.
3. When the absorbent is heated, the oxide layer on the surface of the particles is eliminated, allowing helium gas to diffuse into a large number of absorbent particles.
4. The design of the self-regulation function ensures that the purifier maintains the adsorbent raw material at the most suitable temperature, avoiding the possibility of overheating and loss of control during operation.
5. The microplate is designed to be installed in the upstream gas flow path of the gas chromatograph and connected to the injection port.
6. HPM can remove all pollutants generated by flow controllers, elastic sealing tubes, pressure regulators, and other uncleaned and leak proof system components.
5、 Technical indicators
model |
HP2 |
Purified gas |
He, no, Ar, Kr, Xe, Rn |
The biggest work pressure |
1000psi |
Zui high working temperature |
400℃ |
Zui high flow velocity |
1L/min |
Can remove impurities |
Removable impurities: H2O, H2, O2, N2, NO, NH3, CO, and CO2; |
Inlet impurity concentration: 10ppm level; | |
Export impurity concentration: below 10 ppb level; | |
Other removable impurities include hydrocarbons such as CF4, CCl4, SiH4, and CH4. | |
Impurities not removed |
He, no, Ar, Kr, Xe, Rn |