108 ion sputtering instrument

NegotiableUpdate on 03/12

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

108 is a compact desktop coating system, particularly suitable for high-quality coating of non-conductive samples in scanning electron microscopy imaging

Product Details

108 is a compact desktop coating system, particularly suitable for high-quality coating of non-conductive samples in scanning electron microscopy imaging.

Main characteristics

By using an efficient low-voltage DC magnetron head for cold state fine spraying process, the surface of the sample is avoided from being damaged.
The operation is easy and fast, and the controlled parameters include gas release and argon gas exchange control.
The MTM-10 high-resolution film thickness controller (optional) can be used to accurately measure the thickness of the coated film.
The digital spray coating current control is not affected by the argon gas pressure in the sample chamber, and can achieve consistent coating rate and optimal coating effect.
Multiple metal target materials can be used: Au, Au/Pd, Pt, Pt/Pd (Au target is standard), and target material replacement is fast and convenient.

technical parameter

Sputtering system
Sample Room Size	diameter120mmx120mm high
Target material	Standard goldAuTarget,PtWaiting for other target materials to choose from Size: Diameter57mmx0.1mmthick
Sample stand	Can be loaded12individualSEMThe sample holder has a height adjustable range of50mm
Sputtering control	Microprocessor control, safety interlock
Sputtering current	5~45mAAdjustable
Sputtering head	Low voltage planar magnetron, fast target material replacement, surrounding dark area shield
Meter	Vacuum:Atm - 0.001mbarCurrent:0~50mA
Thickness monitoring (Options)	useMTM-10High resolution thickness monitoring instrument (optional) accurately measures the thickness of the coated film
Control method	A digital timer with gas exchange and release functions, and a "pause" control（5－300s）
vacuum system
Vacuum pump	2Direct connected high-speed vacuum pump
Extraction rate	3.0 m3/hour The vacuum degree has reached0.1mbRequired time30second.
Extreme vacuum	5 x 10^-3mba
Desktop system	The vacuum pump can be placed on a seismic platform, with a fully metal integrated coupling system

Case study of negative staining protein samples made by carbon plating on copper mesh