LAUDA-Noah POU

Thermoelectric process constant temperature controller, specially customized for the semiconductor industry, with a temperature range from–20to90 °C

Based on the validated Peltier heat conduction principle, the LAUDA Noah POU thermoelectric temperature control system can provide repeatable temperature control for plasma etching applications. The dynamic temperature control of electrostatic chuck (ESC) enables POU to be applied to all types of etching processes.

Efficient and energy-saving, space saving, and stable temperature control, this intelligent system can perfectly improve the uniformity of wafer to wafer.